Cita APA

Rafí, J. M., González, M. B., Takakura, K., Tsunoda, I., Yoneoka, M., Beldarrain, O., . . . Campabadal, F. (2013). Impact of electrical stress on the electrical characteristics of 2 MeV electron irradiated metal-oxide-silicon capacitors with atomic layer deposited Al<inf>2</inf>O<inf>3</inf>, HfO<inf>2</inf> and nanolaminated dielectrics.

Citación estilo Chicago

Rafí, Joan Marc, M. B. González, K. Takakura, I. Tsunoda, M. Yoneoka, O. Beldarrain, Miguel Zabala, y Francesca Campabadal. Impact of Electrical Stress On the Electrical Characteristics of 2 MeV Electron Irradiated Metal-oxide-silicon Capacitors With Atomic Layer Deposited Al<inf>2</inf>O<inf>3</inf>, HfO<inf>2</inf> and Nanolaminated Dielectrics. 2013.

Cita MLA

Rafí, Joan Marc, et al. Impact of Electrical Stress On the Electrical Characteristics of 2 MeV Electron Irradiated Metal-oxide-silicon Capacitors With Atomic Layer Deposited Al<inf>2</inf>O<inf>3</inf>, HfO<inf>2</inf> and Nanolaminated Dielectrics. 2013.