Szkudlarek, A., Michalik, J. M., Serrano-Esparza, I., Nováček, Z., Novotná, V., Ozga, P., . . . Teresa, J. M. d. (2024). Graphene removal by water-assisted focused electron-beam-induced etching - unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates.
Citación estilo ChicagoSzkudlarek, Aleksandra, Jan M. Michalik, Inés Serrano-Esparza, Zdeněk Nováček, Veronika Novotná, Piotr Ozga, Czesław Kapusta, y José María de Teresa. Graphene Removal By Water-assisted Focused Electron-beam-induced Etching - Unveiling the Dose and Dwell Time Impact On the Etch Profile and Topographical Changes in SiO2 Substrates. 2024.
Cita MLASzkudlarek, Aleksandra, et al. Graphene Removal By Water-assisted Focused Electron-beam-induced Etching - Unveiling the Dose and Dwell Time Impact On the Etch Profile and Topographical Changes in SiO2 Substrates. 2024.