Martil De La Plaza, I., Olea Ariza, J., Prado Millán, Á. D., & San Andrés Serrano, E. (2006). Hafnium oxide thin films deposited by high pressure reactive sputtering in atmosphere formed with different Ar/O-2 ratios.
Citación estilo ChicagoMartil De La Plaza, Ignacio, Javier Olea Ariza, Álvaro Del Prado Millán, y Enrique San Andrés Serrano. Hafnium Oxide Thin Films Deposited By High Pressure Reactive Sputtering in Atmosphere Formed With Different Ar/O-2 Ratios. 2006.
Cita MLAMartil De La Plaza, Ignacio, Javier Olea Ariza, Álvaro Del Prado Millán, y Enrique San Andrés Serrano. Hafnium Oxide Thin Films Deposited By High Pressure Reactive Sputtering in Atmosphere Formed With Different Ar/O-2 Ratios. 2006.
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