Cita APA

García-Valenzuela, J. A., Rivera, R., Morales-Vilches, A. B., Gerling-Sarabia, L. G., Caballero, A., Asensi López, J. M., . . . Andreu i Batallé, J. (2016). Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers.

Citación estilo Chicago

García-Valenzuela, Jorge A., R. Rivera, A. B. Morales-Vilches, L. G. Gerling-Sarabia, A. Caballero, José Miguel Asensi López, Cristóbal Voz Sánchez, Joan Bertomeu i Balagueró, y Jordi Andreu i Batallé. Main Properties of Al2O3 Thin Films Deposited By Magnetron Sputtering of an Al2O3 Ceramic Target At Different Radio-frequency Power and Argon Pressure and Their Passivation Effect On P-type C-Si Wafers. 2016.

Cita MLA

García-Valenzuela, Jorge A., et al. Main Properties of Al2O3 Thin Films Deposited By Magnetron Sputtering of an Al2O3 Ceramic Target At Different Radio-frequency Power and Argon Pressure and Their Passivation Effect On P-type C-Si Wafers. 2016.