Cita APA

Fonrodona Turon, M., Soler Vilamitjana, D., Escarré i Palou, J., Villar, F., Bertomeu i Balagueró, J., Andreu i Batallé, J., . . . Mohammed-Brahim, T. (2006). Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate.

Citación estilo Chicago

Fonrodona Turon, Marta, David Soler Vilamitjana, Jordi Escarré i Palou, Fernando Villar, Joan Bertomeu i Balagueró, Jordi Andreu i Batallé, A. Saboundji, N. Coulon, y T. Mohammed-Brahim. Low Temperature Amorphous and Nanocrystalline Silicon Thin Film Transistors Deposited By Hot-Wire CVD On Glass Substrate. 2006.

Cita MLA

Fonrodona Turon, Marta, et al. Low Temperature Amorphous and Nanocrystalline Silicon Thin Film Transistors Deposited By Hot-Wire CVD On Glass Substrate. 2006.