Sulzbach, M. C., Estandía, S., Gázquez, J., Sánchez Barrera, F., Fina, I., & Fontcuberta, J. (2020). Blocking of Conducting Channels Widens Window for Ferroelectric Resistive Switching in Interface‐Engineered Hf0.5Zr0.5O2 Tunnel Devices.
Citação norma ChicagoSulzbach, Milena Cervo, Saúl Estandía, Jaume Gázquez, Florencio Sánchez Barrera, Ignasi Fina, y Josep Fontcuberta. Blocking of Conducting Channels Widens Window for Ferroelectric Resistive Switching in Interface‐Engineered Hf0.5Zr0.5O2 Tunnel Devices. 2020.
Citação norma MLASulzbach, Milena Cervo, et al. Blocking of Conducting Channels Widens Window for Ferroelectric Resistive Switching in Interface‐Engineered Hf0.5Zr0.5O2 Tunnel Devices. 2020.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.