Gottlieb, S., Rösner, B., Evangelio Araujo, L., Fernández Regúlez, M., Nogales, A., García-Gutiérrez, M. C., . . . Pérez Murano, F. (2019). Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns.
Chicago Style CitationGottlieb, Steven|||0000-0003-1642-8602, et al. Self-assembly Morphology of Block Copolymers in Sub-10 Nm Topographical Guiding Patterns. 2019.
MLA CitationGottlieb, Steven|||0000-0003-1642-8602, et al. Self-assembly Morphology of Block Copolymers in Sub-10 Nm Topographical Guiding Patterns. 2019.
Warning: These citations may not always be 100% accurate.