Cita APA

Soares, G. V., Krug, C., Miotti, L., Bastos, K. P., Lucovsky, G., Baumvol, I. J. R., & Radtke, C. (2011). Intermixing between HfO2 and GeO2 films deposited on Ge(001) and Si(001): Role of the substrate.

Citación estilo Chicago

Soares, Gabriel Vieira, Cristiano Krug, Leonardo Miotti, Karen Paz Bastos, Gerald Lucovsky, Israel Jacob Rabin Baumvol, y Claudio Radtke. Intermixing between HfO2 and GeO2 Films Deposited On Ge(001) and Si(001): Role of the Substrate. 2011.

Cita MLA

Soares, Gabriel Vieira, et al. Intermixing between HfO2 and GeO2 Films Deposited On Ge(001) and Si(001): Role of the Substrate. 2011.