Duplex treatment on AISI D2 tool steel: plasma nitriding and reactive deposition of TiN and TiAlN films via magnetron sputtering

ABSTRACT In this work, titanium nitride (TiN) and titanium aluminum nitride (TiAIN) films have been obtained via triode magnetron sputtering. The films were deposited using a direct current source on plasma nitrided AISI D2 tool steel (duplex treatment), non-nitrided steel, and silicon. The nitrided...

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Detalles Bibliográficos
Autores: Moretti,Marcio Luiz, Recco,Abel André Cândido
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2022
País:Brasil
Institución:Matéria (Rio de Janeiro. Online)
Repositorio:Matéria (Rio de Janeiro. Online)
Idioma:inglés
OAI Identifier:oai:scielo:S1517-70762022000300238
Acceso en línea:http://old.scielo.br/scielo.php?script=sci_arttext&pid=S1517-70762022000300238
Access Level:acceso abierto
Palabra clave:AISI D2 steel
duplex treatment
plasma nitriding
reactive deposition
triode magnetron sputtering
Descripción
Sumario:ABSTRACT In this work, titanium nitride (TiN) and titanium aluminum nitride (TiAIN) films have been obtained via triode magnetron sputtering. The films were deposited using a direct current source on plasma nitrided AISI D2 tool steel (duplex treatment), non-nitrided steel, and silicon. The nitrided layer was characterized by scanning electron microscopy (SEM), Vickers microhardness, and X-ray diffraction (XRD). The films were characterized by SEM and XRD. The mechanical properties of the coatings were determined using the instrumented indentation technique (IIT) and the adhesion of the film to the substrate was qualitatively evaluated using the Rockwell C test. Both films presented no significant variation in hardness (H) and elastic modulus (E). However, compared to the films obtained in non-nitrided steel, the duplex treatment improvided the film-substrate adhesion. The improvement in adhesion can be attributed to the preliminary plasma nitriding treatment and the compressive loads acting on the nitrided surface.