Darriba Battaglin, F. A. [., Hosokawa, R. S. [., Cruz, N. C. d. [., Caseli, L., Rangel, E. C. [., Silva, T. F. d., & Tabacniks, M. H. (2014). Innovative low temperature plasma approach for deposition of alumina films.
Citación estilo ChicagoDarriba Battaglin, Felipe Augusto [UNESP], Ricardo Shindi [UNESP] Hosokawa, Nilson Cristino da [UNESP] Cruz, Luciano Caseli, Elidiane Cipriano [UNESP] Rangel, Tiago Fiorini da Silva, y Manfredo Harri Tabacniks. Innovative Low Temperature Plasma Approach for Deposition of Alumina Films. 2014.
Cita MLADarriba Battaglin, Felipe Augusto [UNESP], et al. Innovative Low Temperature Plasma Approach for Deposition of Alumina Films. 2014.
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