Cita APA

Zazpe, R., Ungureanu, M., Golmar, F., Stoliar, P. A., Llopis, R., Casanova, F., . . . Hueso Falcon, I. (2014). Resistive switching dependence on atomic layer deposition parameters in HfO2-based memory devices.

Citación estilo Chicago

Zazpe, Raúl, Mariana Ungureanu, Federico Golmar, Pablo Alberto Stoliar, Roger Llopis, Félix Casanova, David F. Pickup, Celia Rogero, y Idaira Hueso Falcon. Resistive Switching Dependence On Atomic Layer Deposition Parameters in HfO2-based Memory Devices. 2014.

Cita MLA

Zazpe, Raúl, et al. Resistive Switching Dependence On Atomic Layer Deposition Parameters in HfO2-based Memory Devices. 2014.